Quantifying aluminum and semiconductor industry perfluorocarbon emissions from atmospheric measurements

TitleQuantifying aluminum and semiconductor industry perfluorocarbon emissions from atmospheric measurements
Publication TypeJournal Article
Year of Publication2014
AuthorsKim J., Fraser PJ, Li S., Mühle J, Ganesan A.L, Krummel PB, Steele LP, Park S., Kim S.K, Park M.K, Arnold T., Harth CM, Salameh PK, Prinn RG, Weiss RF, Kim K.R
JournalGeophysical Research Letters
Date Published2014/07
Type of ArticleArticle
ISBN Number0094-8276
Accession NumberWOS:000340295300048
Keywordscf4; decomposition; gas; pfcs; plasma; sf6

The potent anthropogenic perfluorocarbon greenhouse gases tetrafluoromethane (CF4) and hexafluoroethane (C2F6) are emitted to the atmosphere mainly by the aluminum and semiconductor industries. Global emissions of these perfluorocarbons (PFCs) calculated from atmospheric measurements are significantly greater than expected from reported national and industry-based emission inventories. In this study, in situ measurements of the two PFCs in the Advanced Global Atmospheric Gases Experiment network are used to show that their emission ratio varies according to the relative regional presence of these two industries, providing an industry-specific emission "signature" to apportion the observed emissions. Our results suggest that underestimated emissions from the global semiconductor industry during 1990-2010, as well as from China's aluminum industry after 2002, account for the observed differences between emissions based on atmospheric measurements and on inventories. These differences are significant despite the large uncertainties in emissions based on the methodologies used by these industries.

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